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Cypress strengthens photomask partnership with Toppan for 65nm development

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July 23, 2025

July 23, 2025 /SemiMedia/ — Cypress Semiconductor Corp. has expanded its collaboration with Toppan Photomasks Inc. through a new joint development agreement focused on 65-nanometer photomask technology, alongside a renewed multi-year supply deal.

Under the three-year agreement, Toppan’s facility in Round Rock, Texas, will supply the majority of photomasks needed for Cypress’s commercial chip production. The extended partnership builds on an initial agreement signed in 2002, when Toppan was known as DuPont Photomasks.

“Advanced photomasks are crucial to the development and timely delivery of technologies required by our customers throughout the world,” said Shahin Sharifzadeh, executive vice president of manufacturing and fab administration at Cypress.

The agreement reflects Cypress’s continued focus on process innovation and supply chain optimization. The collaboration supports Cypress’s efforts to bring high-performance semiconductor products to market and underscores Toppan’s role as a key enabler in advanced lithography.

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65nm node advanced chip production Cypress Semiconductor electronic components news Electronic components supplier Electronic parts supplier Lithography technology Semiconductor manufacturing Semiconductor photomask Toppan Photomasks
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